Semiconductor manufacturing apparatus and command setting method

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364191, 364192, 364188, G06F 1900

Patent

active

061426601

ABSTRACT:
A semiconductor manufacturing method and apparatus using a plurality of maintenance commands for automatically measuring errors caused by the apparatus or caused by a wafer treatment process, by using measuring functions of the apparatus. The apparatus includes a display device for displaying a list of the plurality of maintenance commands, a console-side control device for enabling an operator to select some of the plurality of maintenance commands displayed by the display device, to generate a maintenance menu in which some of the plurality of maintenance commands are combined as desired by the operator and to edit the maintenance menu, a storage device for storing the maintenance menu generated and edited using the console-side control device and an apparatus-side control device for successively executing the maintenance commands in the maintenance menu stored in the storage device when the apparatus-side control device receives an instruction to execute the maintenance menu.

REFERENCES:
patent: 5029065 (1991-07-01), Nau et al.
patent: 5197118 (1993-03-01), Sato et al.
patent: 5249016 (1993-09-01), Tanaka
patent: 5319353 (1994-06-01), Ohnishi et al.

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