Non-toxic photographic developer composition for processing x-ra

Radiation imagery chemistry: process – composition – or product th – Nonradiation sensitive image processing compositions or... – Hardener

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430436, 430441, 430451, 430464, 430478, 430486, G03C 5305

Patent

active

052780350

ABSTRACT:
A non-hydroquinone and non-alkali metal hydroxide containing developer composition for radiographic materials and a method of use thereof are provided. The developer composition comprises a developer selected from the group consisting of ascorbic acid and sugar-type derivatives thereof, stereoisomers and diastereoisomers of ascorbic acid and its sugar-type derivatives, their salts and mixtures thereof, together with a sulfite, a 3-pyrazolidone compound, and an anti-swelling agent selected from the group consisting of sodium sulfate, glutaraldehyde or mixtures thereof, said composition having a pH of from 9.5 to 10.6, and said developer being present in an amount of at least about 15 grams, said sulfite being present in an amount of from 2 to 50 grams, said swelling control agent being present in an amount of from 35 to 90 grams, and water to 1.0 liter.

REFERENCES:
patent: Re26601 (1969-06-01), Allen et al.
patent: 2688549 (1954-09-01), James et al.
patent: 3658527 (1972-04-01), Kunz et al.
patent: 4155763 (1979-05-01), Hasebe et al.
patent: 4279987 (1981-07-01), Ogi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Non-toxic photographic developer composition for processing x-ra does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Non-toxic photographic developer composition for processing x-ra, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-toxic photographic developer composition for processing x-ra will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1630489

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.