Method for manufacturing field emission display

Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly

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445 50, H01J 902

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active

052776387

ABSTRACT:
A field emission display FED is manufactured by a method for manufacturing the FED comprising the steps of forming successively a conductive coating and first photoresist coating on a transparent insulating substrate; exposing the first photoresist coating to the light and removing it except a part where a microtip is formed; etching in a predetermined depth the conductive coating using the first photoresist pattern as a mask to form a plurality of columns; depositing an insulating coating on the etched and exposed conductive coating and removing the remaining first photoresist pattern by a lift off method; depositing and patterning a second photoresist coating on the exposed column and the insulating coating to form a second photoresist pattern in order that the thickness of the remaining second photoresist coating becomes smaller than that of the exposed column; etching the column through a selective isotropic or anisotropic etching process using the second photoresist pattern as the mask to form the sharp end of the microtip; and depositing a gate layer on the insulating coating and removing the remaining second photoresist pattern. As a result, the end of the microtip is formed under the surface of the gate so as to be less influenced by an ion bombardment thereby reducing the abrasion of the microtip.

REFERENCES:
patent: 4908539 (1990-03-01), Meyer
patent: 4968382 (1990-11-01), Jacobson et al.

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