Projection exposure apparatus including a temperature control sy

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

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355 53, 355 67, G03B 2742, G03B 2754

Patent

active

058122427

ABSTRACT:
A projection exposure apparatus according to the present invention (in particular, an excimer stepper) includes a projection optical system, which may include a lens element of synthetic quartz and a lens element of fluorite. The synthetic quartz lens element is temperature-controlled by a first temperature controller with a degree of accuracy of .+-.0.01.degree. C., for example. The fluorite lens element is temperature-controlled by a second temperature controller with a degree of accuracy of .+-.0.005.degree. C., for example. Therefore, even if the projection optical system includes lens elements with different coefficients of thermal expansion, temperature control can be made with accuracy suitable for each of the elements. Consequently, the apparatus is not enlarged. In addition, with an exposure light source of even short wavelength, it is possible to attain good imaging characteristics.

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patent: 4989031 (1991-01-01), Kamiya
patent: 5270771 (1993-12-01), Sato
patent: 5576895 (1996-11-01), Ikeda
patent: 5633698 (1997-05-01), Imai
patent: 5636000 (1997-06-01), Ushida et al.
patent: 5638223 (1997-06-01), Ikeda

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