Sub-micron device fabrication using multiple aperture filter

Details Sub-micron device fabrication using multiple aperture filter Sub-micron device fabrication using multiple aperture filter

1992-07-14

1994-05-31

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430296, G03F 900

Patent

active

053168798

ABSTRACT:
Fabrication of sub-micron design rule integrated circuits entails imposition of patterning information, consisting of degree of scattering, on a projected scanning beam of accelerated electrons by means of a mask, imaging being dependent upon passage through a back focal plane filter including a plurality of apertures for selectively passing relatively unscattered electrons.

REFERENCES:
D. P. Kern, et al, Microcircuit Engineering, pp. 184-194, Academic Press, London (1985).
H. C. Pfeiffer, et al, Microelectronic Engineering 17, pp. 7-10, (1992).
H. C. Pfeiffer, Scanning Electron Microscopy/1972, Part 2, IIT Research Institute, Chicago, Illinois, Apri. 1972.
M. A. Sturans, et al, J. Vac. Sci. Technol. B6(6), pp. 1995-1998, Nov./Dec. 1988.
M. A. Sturans, et al, J. Vac. Sci. Technol. B8(6), pp. 1682-1685 Nov./Dec. 1990.
G. H. Jansen, et al, Microcircuit Engineering, pp. 166-176, Academy Press, London (1985).
H. Ohiwa, J. Vac. Sci. Technol., 15(3), pp. 849-853, May/Jun. 1978.
H. C. Pfeiffer, et al, J. Vac. Sci. Technol., 19(4), pp. 1058-1063, Nov./Dec. 1981.
M. A. Sturans, et al, Microcircuit Engineering 83, pp. 106-116, Academy Press, London (1983).

Affiliated with

Also associated with

Rating

Sub-micron device fabrication using multiple aperture filter does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sub-micron device fabrication using multiple aperture filter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sub-micron device fabrication using multiple aperture filter will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1627136