Vapor device and method for drying articles such as semiconducto

Details Vapor device and method for drying articles such as semiconducto Vapor device and method for drying articles such as semiconducto

1992-05-22

1994-05-31

Bennet, Henry A.

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure is subatmospheric

34 92, 34 75, 34 76, 34418, 134 21, F26B 504

Patent

active

053157664

ABSTRACT:
A device for drying articles such as semiconductor wafers comprising a vacuum process chamber for holding articles to be dried; a vapor generator substantially isolated from the process chamber for supplying a substance such as isopropyl alcohol in vapor form to the process chamber; a heater for heating the walls of the process chamber to discourage the substance vapor from condensing on the inside walls of the process chamber. The device can also be used for rinsing and cleansing articles prior to drying.

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