Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1996-09-27
1998-09-22
Breneman, Bruce
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
20429803, 20429832, 216 61, 438 17, G23F 102
Patent
active
058109633
ABSTRACT:
In a conductive plasma process chamber, a susceptor, which serves as an electrode and on which a target substrate is placed, is arranged. During a plasma process, the process chamber is supplied with a process gas while being exhausted, so that the chamber is kept at a constant vacuum pressure. A RF power of 13.56 MHz from an RF power supply is amplified and applied to the susceptor through a directional coupler and a matching circuit. A reflection wave of the RF power reflected by the susceptor is extracted by the directional coupler and is subjected to envelope wave detection by a wave detector, to generate a wave detection signal. The wave detection signal is compared with a reference voltage in a comparator, to determine presence or absence of an occurrence of abnormal discharge. When abnormal discharge occurs, the RF power is cut off for a predetermined period of time and the abnormal discharge is damped.
REFERENCES:
patent: 4557819 (1985-12-01), Meacham et al.
patent: 4990859 (1991-02-01), Bouyer et al.
patent: 5169407 (1992-12-01), Mase et al.
patent: 5314603 (1994-05-01), Sugiyama et al.
Breneman Bruce
Kabushiki Kaisha Toshiba
Weingart Thomas W.
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