Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-08-18
1998-10-27
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
058276254
ABSTRACT:
A process for designing and forming a reticle (40) as well as the manufacture of a semiconductor substrate (50) using that reticle (40). The present invention places outriggers (32, 34, 36) between features (30) in both dense and semi-dense feature patterns to assist in the patterning of device features. The width of the outriggers can be changed based on pitch and location between features in a semi-dense or dense feature pattern. In one embodiment, the outriggers can be manually or automatically inserted into the layout file after the locations of the attenuating features have been determined. The outriggers are not patterned on the substrate, but assist in forming resist features of uniform width.
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Kling Michael E.
Lucas Kevin
Reich Alfred J.
Roman Bernard J.
Godsey Sandra L.
Meyer George R.
Motorola Inc.
Rosasco S.
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