Photosensitive composition with 2-halomethyl-5-substituted-1,3,4

Details Photosensitive composition with 2-halomethyl-5-substituted-1,3,4 Photosensitive composition with 2-halomethyl-5-substituted-1,3,4

1985-02-25

1987-10-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430175, 430191, 430196, 430281, 430283, 430284, 430285, 430286, 430287, 430920, 430925, 548143, G03C 160, G03C 170, G03C 171, G03C 1727

Patent

active

047013990

ABSTRACT:
A photosensitive composition containing a 2-halomethyl-5-substituted-1,3,4-oxadiazole compound represented by the following general formula (I): ##STR1## wherein A represents a substituted or unsubstituted aromatic residue; X represents a hydrogen atom, a cyano group, an alkyl group or an aryl group; Y represents a chlorine atom or a bromine atom; and n represents an integer of 1 to 3.
The free radical generating agent represented by the general formula (I) has a photosensitive wavelength range from near ultraviolet range to visible range, high photo-decomposition sensitivity and good compatibility with other components present in the photosensitive composition.
The photosensitive composition is suitable for use in light-sensitive printing plates or photo-resists.

REFERENCES:
patent: 3558316 (1971-01-01), Keberle et al.
patent: 4104468 (1978-08-01), Valenti
patent: 4212970 (1980-07-01), Iwasaki
patent: 4232106 (1980-11-01), Iwasaki et al.
patent: 4279982 (1981-07-01), Iwasaki et al.
patent: 4282309 (1981-08-01), Laridon et al.

Affiliated with

Also associated with

Rating

Photosensitive composition with 2-halomethyl-5-substituted-1,3,4 does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive composition with 2-halomethyl-5-substituted-1,3,4, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition with 2-halomethyl-5-substituted-1,3,4 will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1612146