Method of fabricating non-silicon materials on silicon substrate

Fishing – trapping – and vermin destroying

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437107, 437110, 437126, 437128, 437132, 437976, 148DIG72, 148DIG97, 148DIG160, 148DIG169, 357 16, 156610, 156612, H01L 21203, H01L 2120

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047693410

ABSTRACT:
A semiconductor device comprising an epitaxially grown tin and Group IV compound semiconductor region on which at least one other semiconductor is grown lattice matched to the adjacent portion of the tin containing region. A large number of semiconductors may thus be grown.

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Bean et al., "Pseudomorphic Growth of Ge.sub.x Si.sub.1-x on Silicon by Molecular Beam Epitaxy", Appl. Phys. Lett., 44(1), Jan. 1, 1984, pp. 102-104.
Bean, "Recent Developments in the Strained Layer Epitaxy of Germanium-Silicon Alloys", J. Vac. Sci. Technol. B 4(6), Nov./Dec. 1986, pp. 1427-1429.
Parker, The Technology & Physics of Molecular Beam Epitaxy, Plenum Publishing, New York, NY, Sep. 1985, pp. 179-181 & 667-669.

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