Integrated tungsten/tungsten silicide plug process

Details Integrated tungsten/tungsten silicide plug process Integrated tungsten/tungsten silicide plug process

1996-04-16

1997-02-18

Fourson, George

Fishing, trapping, and vermin destroying

437192, 437190, 1566361, H01L 2144

Patent

active

056041586

ABSTRACT:
A method of filling an opening in an insulating layer of an integrated circuit. First a tungsten-silicide layer is deposited over the opening. Next a tungsten layer is deposited onto the tungsten-silicide layer such that the opening is substantially filed with tungsten. The tungsten and tungsten-silicide layer are then chemically-mechanically polished back until the insulating layer is substantially revealed.

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