Target support adjusting fixture

Details Target support adjusting fixture Target support adjusting fixture

1983-12-30

1984-10-23

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044787014

ABSTRACT:
A sputtering apparatus for the deposition of thin films of material upon substrates is disclosed having an improved target mounting mechanism. The improved mounting mechanism provides the capability to easily raise and lower the target with respect to the substrate while maintaining critical alignment of the vacuum seal components. Additionally, capability is provided to easily adjust the angular position of the target with respect to the substrate being coated.

REFERENCES:
patent: 3707452 (1972-12-01), Lester et al.
patent: 4014779 (1977-03-01), Kuehnle
patent: 4204936 (1980-03-01), Hartsough
patent: 4308126 (1981-12-01), Wright
patent: 4309266 (1982-01-01), Nakamura et al.
patent: 4340462 (1982-07-01), Kock
patent: 4353777 (1982-10-01), Jacob

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