1988-05-13
1990-08-28
James, Andrew J.
357 71, H01L 2354, H01L 2348
Patent
active
049530038
ABSTRACT:
In a pressure-contacted power semiconductor device, a series of metallization layers provide a pressure-contacting electrode comprising a titanium layer upon a semiconductor body, and a copper layer over the titanium layer. To prevent oxidation of the surface of the copper layer at least one additional metallization layer is arranged over the copper layer.
REFERENCES:
patent: 3885243 (1975-05-01), Weisshaar et al.
patent: 3942187 (1976-03-01), Gelsing et al.
patent: 3961350 (1976-06-01), Tiefert
patent: 4035831 (1977-07-01), Saeki
patent: 4300149 (1981-11-01), Howard et al.
patent: 4305087 (1981-12-01), Wislocky
patent: 4403242 (1983-09-01), Tsuruoka
patent: 4408216 (1983-10-01), Gould
patent: 4480261 (1984-10-01), Hattori et al.
patent: 4505029 (1985-03-01), Owyang et al.
patent: 4523219 (1985-06-01), Heidegger et al.
patent: 4591896 (1986-05-01), Kikuchi
patent: 4724475 (1988-02-01), Matsuda
patent: 4885630 (1989-12-01), Temple
IBM Technical Disclosure Bulletin, vol. 29, No. 3, Aug. 1986, "Diffusion Barriers for CU".
Standard Search Report, File RS 78498 DE.
Edelman Lawrence C.
James Andrew J.
Nguyen Viet Q.
Siemens Aktiengesellschaft
LandOfFree
Power semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Power semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Power semiconductor device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1593474