Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Silver compound sensitizer containing
Patent
1996-09-18
2000-05-02
Chea, Thorl
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Silver compound sensitizer containing
430250, 430614, G03C 134
Patent
active
060570903
ABSTRACT:
A silver halide photographic material is described, which contains the compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents a substituted or unsubstituted alkylene group having from 1 to 5 carbon atoms; X represents a water-soluble group; and R.sup.2 represents a substituted or unsubstituted alkyl group having the sum total of from 14 to 40 carbon atoms, an alkenyl group, an aryl group, an alkoxyl group, --NR.sup.3 R.sup.4 (R.sup.3 and R.sup.4 each independently represents an alkyl group having from 1 to 40 carbon atoms, a hydrogen atom, or an aryl group), a bicycloalkyl group, a bicycloalkenyl group, a cycloalkyl group, a cycloalkenyl group or a heterocyclic group, provided that when X represents a quaternary ammonium salt structure, R.sup.2 does not represent an alkyl group having from 14 to 17 carbon atoms.
REFERENCES:
patent: 2695234 (1954-11-01), Hove et al.
patent: 3806345 (1974-04-01), Willems et al.
patent: 4330606 (1982-05-01), Sobel et al.
patent: 4339515 (1982-07-01), Schranz et al.
patent: 4753869 (1988-06-01), Long et al.
patent: 5206131 (1993-04-01), Matsuda et al.
Mikoshiba Hisashi
Morigaki Masakazu
Sakurazawa Mamoru
Chea Thorl
Fuji Photo Film Co. , Ltd.
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