1985-10-11
1987-09-29
Edlow, Martin H.
357 232, 357 237, 357 16, H01L 2712
Patent
active
046971971
ABSTRACT:
A transistor has a superlattice in the channel region. The superlattice has alternate interleaved layers of undoped wide and narrow bandgap materials with the layers extending in a direction parallel to the channel region. Preferably a narrow band gap layer is adjacent a gate insulator to provide maximum increase in mobility.
REFERENCES:
patent: 4194935 (1980-03-01), Dingle et al.
patent: 4203123 (1980-05-01), Shanks
patent: 4590507 (1986-05-01), Capasso
"Observation of Confined Electronic States in Ge.sub.x Si.sub.1-x /Si Strained-Layer Superlattices", F. Cerdeira et al., Physical Review B, vol. 31, No. 2, Jan. 15, 1985, pp. 1202 to 1204.
"Amorphous Semiconductor Superlattices", B. Abeles et al., Physical Review Letters, vol. 31, No. 2, Nov. 21, 1983, pp. 2003 to 2006.
Edlow Martin H.
Hallacher Lester L.
Irlbeck Dennis H.
RCA Corp.
Whitacre Eugene M.
LandOfFree
Transistor having a superlattice does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Transistor having a superlattice, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Transistor having a superlattice will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1591653