Zirconium oxide sinter for forming thin film thereof and method

Details Zirconium oxide sinter for forming thin film thereof and method Zirconium oxide sinter for forming thin film thereof and method

1989-03-15

1992-04-21

Bell, Mark L.

Compositions: ceramic

Ceramic compositions

Refractory

501104, 264 65, C04B 3548

Patent

active

051067943

ABSTRACT:
Zirconium oxide sinter for use in forming a thin film thereof by vapor deposition etc., having a purity not less than 99.0% by weight with unavoidable hafnium oxide and a density more than 4.9 g/cm.sup.3. Desirably the sinter further contains calcium oxide in an amount from 50 to 2000 ppm. The sinter can produce a uniform zirconium oxide thin film which can be used in optical applications with superior characteristics.

REFERENCES:
patent: 3175919 (1965-03-01), Smoot et al.
patent: 3565645 (1971-02-01), Anderson
patent: 3929498 (1975-12-01), Hancock et al.
patent: 4344904 (1982-08-01), Yamada et al.
patent: 4789651 (1988-12-01), Sugie et al.

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