Electrochemical depyrophorization of raney nickel electrodes

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204290R, 204293, C23F 1300, C25B 1100

Patent

active

044154160

ABSTRACT:
An electrochemical oxidation treatment for monolithic cathode structures having a Beta phase Raney nickel alloy surface thereon is disclosed. When a freshly leached structure is made the anode in an electrochemical cell, which is operated at a current density of between about 40 and about 60 mA/cm.sup.2 until the polarization voltage is reduced from the open circuit value of about -1250 mV by about 500 to about 700 mV, the treated structure is free of subsequent problems with pyrophoricity. Cathodic structures treated this way show substantially no difference in hydrogen overvoltage characteristics and long-term stabilities when compared to chemically depyrophoricized materials of the same composition and structure.

REFERENCES:
patent: 1127911 (1915-02-01), Morey
patent: 2810666 (1957-10-01), Gleason
patent: 3379635 (1968-04-01), von Doehren et al.
patent: 3573038 (1971-05-01), Jung et al.
patent: 3673116 (1972-06-01), Richter
patent: 3674710 (1972-07-01), Richter et al.
patent: 4162949 (1979-07-01), Hine
patent: 4177129 (1979-12-01), Kwo
patent: 4224248 (1980-09-01), Birkenstock et al.
patent: 4240895 (1980-12-01), Gray

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrochemical depyrophorization of raney nickel electrodes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrochemical depyrophorization of raney nickel electrodes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemical depyrophorization of raney nickel electrodes will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-158382

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.