Lithographic process analysis and control system

Details Lithographic process analysis and control system Lithographic process analysis and control system

1987-10-20

1989-12-26

Gruber, Felix D.

Boots, shoes, and leggings

250396R, 2504922, G06F 1546, G21K 504, H01J 37302

Patent

active

048902390

ABSTRACT:
A lithographic process analysis and control system which provides a modeled verison of a lithographic process in the dimensions of feature width, focus and exposure. This system uses the model to quickly determine the range of focus and exposure limits for obtaining the desired feature width. The system has flexible graphic display capability for displaying graphic representations of the data as measured and modeled.

REFERENCES:
patent: 4393312 (1983-07-01), Collier et al.
patent: 4430571 (1984-02-01), Smith et al.
patent: 4694178 (1987-09-01), Harte
patent: 4698509 (1987-10-01), Wells et al.
patent: 4718019 (1988-01-01), Fillion et al.
patent: 4777369 (1988-10-01), Nakamura et al.
patent: 4785189 (1988-11-01), Wells
patent: 4812661 (1989-03-01), Owen

Affiliated with

Also associated with

Rating

Lithographic process analysis and control system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic process analysis and control system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic process analysis and control system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1580634