Positive photoresist with cresol-formaldehyde novolak resin and

Details Positive photoresist with cresol-formaldehyde novolak resin and Positive photoresist with cresol-formaldehyde novolak resin and

1984-10-31

1986-05-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430311, 430323, 430326, 430330, G03C 160, G03C 154

Patent

active

045871965

ABSTRACT:
Cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range for use in fast positive photoresist compositions together with one or more sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation and developed in alkaline solution, yielding a relief pattern of resist on substrate useful for a number of applications.

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patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4308368 (1981-12-01), Kubo
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4529682 (1985-07-01), Toukhy

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