Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1984-08-29
1987-05-19
Bleutge, John C.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522 10, 522 26, C08F 250, C08F 2020
Patent
active
046669523
ABSTRACT:
Photopolymerizable mixtures comprising one or more photopolymerizable, olefinically unsaturated compounds and one or more photoinitiators or photosensitizers, with or without other conventional additives and/or assistants, contain, as an activator, a tertiary amine of the general formula (I) ##STR1## wherein R.sup.1 and R.sup.2 are each an unsubstituted alkyl, cycloalkyl or phenyl radical, hydroxyl or alkoxy, or R.sup.1 and R.sup.2 are bonded together to form a cyclic alkylene radical, R.sup.3 has the same meanings as R.sup.1 or R.sup.2 and may furthermore be hydrogen, acyloxy or substituted benzoyloxy, and R.sup.4 and R.sup.5 are each an unsubstituted or substituted alkyl, cycloalkyl or phenyl radical, or R.sup.4 and R.sup.5 are bonded together to form a cyclic alkylene or alkyleneoxyalkylene radical.
REFERENCES:
patent: 2138762 (1938-11-01), Harmon
patent: 3650669 (1972-03-01), Osborn et al.
patent: 3759807 (1973-09-01), Osborn et al.
patent: 4054682 (1977-10-01), Kuesters
patent: 4071424 (1978-01-01), Dart et al.
patent: 4089762 (1978-05-01), Frodsham
patent: 4233396 (1980-11-01), Armstrong et al.
Chemical Abstracts 68:48753d "Effect of Structure" Chaltykyan et al, 1968.
Kosar "Light Sensitive Systems", 1965, pp. XIII, 170-171.
"Photopolymerization of Surface Coatings", 1982, Roffey, Wiley & Sons, pp. 70, 71.
Chemical Abstracts, vol. 93, No. 195508x "Photosensitive Laminates", 1980, Toyobo.
Chemical Abstracts, vol. 93, No. 228619q "Photosensitive Resins", 1980, Toyobo.
Chemical Abstracts, vol. 97, No. 101715v "Photosensitive Resin", 1982, Toyobo.
Henne Andreas
Jacobi Manfred
BASF - Aktiengesellschaft
Bleutge John C.
Koeckert Arthur H.
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