Phase shift layer-containing photomask, and its production and c

Details Phase shift layer-containing photomask, and its production and c Phase shift layer-containing photomask, and its production and c

1996-05-09

1997-11-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, 430330, 20419237, G03F 900

Patent

active

056886179

ABSTRACT:
The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower costs as well.
For instance, a photomask blank of the structure that a substrate is provided thereon with an electrically conductive layer and a light-shielding thin film in this order is used to coat a starting material for spin-on-glass uniformly on a light-shielding pattern formed thereon. A pattern is directly drawn on the coaxed-spin-on-glass layer with energy beams emanating from electron beam exposure hardware, etc., and the substrate is developed with a solvent after pattern drawing with energy beams to wash off an excessive spin-on-glass portion other than the spin-on-glass layer irradiated with the ionizing radiations. Finally, the post-development substrate is baked to form a phase shifter pattern.

REFERENCES:
patent: 4873163 (1989-10-01), Watakabe et al.
patent: 5032491 (1991-07-01), Okumura et al.
patent: 5085957 (1992-02-01), Hosono
patent: 5100503 (1992-03-01), Allman et al.

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