Photosensitive material containing disazo compound for use in el

Details Photosensitive material containing disazo compound for use in el Photosensitive material containing disazo compound for use in el

1985-06-11

1987-05-19

Higel, Floyd D.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 58, 430 59, 430 71, 430 72, 430 74, 430 75, 430 76, 430 77, 430 78, 534561, 534738, 534797, 534830, C09B 35039, C09B 35215, G03G 506, G03G 514

Patent

active

046668055

ABSTRACT:
The present invention relates to a novel disazo compound having the following general formula (I), ##STR1## wherein A represents ##STR2## (wherein R represents an alkyl, alkoxy, nitro, halogen, cyano or halomethyl group; n represents an integer of 0, 1, 2 or 3; and R may be the same or different when n is an integer of 2 or 3), and a method for preparing the same.

REFERENCES:
patent: 3687673 (1972-08-01), Yoshida et al.
patent: 4390611 (1983-06-01), Ishikawa et al.
patent: 4500619 (1985-02-01), Ishikawa et al.
patent: 4533613 (1985-08-01), Kawamura et al.
Kamoshida et al., Chemical Abstracts, vol. 98, #170382s (1983).
Roemer, Chemical Abstracts, vol. 95, #186873b (1981).

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