Method of manufacturing a floating gate with high gate coupling

Fishing – trapping – and vermin destroying

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437 52, 437186, H01L 21265, H01L 218247

Patent

active

056772165

ABSTRACT:
The present invention is a method of manufacturing a floating gate with high gate coupling ratio for use in a EPROM and EEPROM. The gate coupling ratio is the ratio of the surface area of the inter-poly and the tunnel oxide. This invention utilizes a floating gate having a trench so as to increase the surface area of the inter-poly. Thus, a floating gate having high gate coupling ratio is achieved.

REFERENCES:
patent: 5304505 (1994-04-01), Hazani
patent: 5543339 (1996-08-01), Roth et al.

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