Programmable multizone gas injector for single-wafer semiconduct

Details Programmable multizone gas injector for single-wafer semiconduct Programmable multizone gas injector for single-wafer semiconduct

1994-06-17

1995-09-26

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, C23C 1600

Patent

active

054531241

ABSTRACT:
A programmable multizone fluids injector for use in single-wafer semiconductor processing equipment including an injector having a plurality of orifices therein which are divided into a number of separate zones or areas. These zones or areas are connected by means of appropriate passageways and conduits to a source of process fluids. Each of the separate conduits has at least one flow control device located therein for independently controlling the amounts and ratios of process fluids flowing into each zone. The fluid control devices are responsive to input signals so that the fluid flow rates from the orifices can maintain a desired flow pattern within the process chamber to suit the individual needs of a particular fabrication processs.

REFERENCES:
patent: 3854443 (1974-12-01), Baerg
patent: 4369031 (1983-01-01), Goldman
patent: 4980204 (1990-12-01), Fujii
patent: 4993358 (1991-02-01), Mahawili
patent: 5045496 (1991-09-01), Hess
patent: 5134965 (1992-08-01), Tokuda et al.

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