Method for the formation of monomolecular adsorption films or bu

Details Method for the formation of monomolecular adsorption films or bu Method for the formation of monomolecular adsorption films or bu

1989-06-27

1991-07-30

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415764, 20415774, 20415776, 427 35, 427 36, 427 531, 427 541, 4274301, G11B 572

Patent

active

050357824

ABSTRACT:
A method for the formation of monomolecular adsorption films of a silane compound having a diacetylene bond is described. The silane compound is chemically adsorbed on a substrate through .dbd.SiO-- bonds and the resultant film is significantly reduced in number of defects such as pinholes. When the monomolecular film is irradiated with actinic light, the diacetylene bonds are convered into a conjugated diacetylene polymer. Similarly, a built-up film of a desired number of monomolecular layers of a silane compound having an acetylene bond formed on a substrate by chemical adsorption and a corresponding number of monomolecular layers of an aliphatic acid or alcohol having an acetylene bond and alternately deposited on the first-mentioned layer is also provided.

REFERENCES:
patent: 4539061 (1985-09-01), Sagiv
patent: 4673474 (1987-06-01), Ogawa
patent: 4751171 (1988-06-01), Ogawa
patent: 4761316 (1988-08-01), Ogawa
patent: 4875759 (1989-10-01), Ogawa

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