Method of making photoelectric conversion device

Details Method of making photoelectric conversion device Method of making photoelectric conversion device

1985-09-17

1986-12-30

Weisstuch, Aaron

Metal working

Method of mechanical manufacture

Assembling or joining

29583, 156643, 219121LJ, H01L 3118

Patent

active

046318011

ABSTRACT:
A manufacturing method of a photoelectric conversion device which comprises a plurality n of semiconductor elements U.sub.1 to U.sub.n formed on a substrate side by side and connected in series one after another. On the substrate a first conductive layer is formed and then, it is subjected to first laser beam scanning to form groove G.sub.1 to G.sub.n-1 and first electrode E.sub.1 to E.sub.n respectively separated by the grooves G.sub.1 to G.sub.n-1. Next, on the substrate a N (or P) -I- P (or N) type non-single-crystal semiconductor laminate member is formed to cover the grooves G.sub.1 to G.sub.n-1 and the electrodes E.sub.1 to E.sub.n and then, the laminate member is subjected to second laser beam scanning to form grooves O.sub.1 to O.sub.n-1 respectively extending into the first electrodes E.sub.1 to E.sub.n-1 and N (or P) -I- P (or N) type non-single-crystal semiconductor laminate member Q.sub.1 to Q.sub.n. Next, a second conductive layer is formed to continuously extend on the laminate member Q.sub.1 to Q.sub.n and extends into the grooves Q.sub.1 to Q.sub.n-1 and then, the second conductive layer is subjected to the third laser beam scanning to form isolating portions H.sub.1 to H.sub.n-1 and electrodes F.sub.1 to F.sub.n respectively connected to the first electrodes E.sub.1 to E.sub.n-1 through the coupling portions K.sub.1 to K.sub.n-1. The second and/or third laser beam scanning steps are followed by an etch using a gas such as hydrogen fluoride, hydrogen chloride, or a Freon gas, or a liquid such as hydro fluoric acid, hydrochloric acid, or Freon liquid.

REFERENCES:
patent: 4528065 (1985-07-01), Yamazaki

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