Method of removing metal impurity

Liquid purification or separation – Processes – Ion exchange or selective sorption

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210688, 210663, 423488, B01D 1502

Patent

active

054055350

ABSTRACT:
A method of removing a metal impurity, including the steps of: removing oxygen dissolved in a hydrofluoric-acid-containing chemical solution; and in order to remove a metal impurity contained in the hydrofluoric-acid-containing chemical solution free from the dissolved oxygen, bringing or circulating the hydrofluoric-acid-containing chemical solution into contact with or in a column filled with silicon granules to adsorb the metal impurity on the silicon granules.

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patent: 4172879 (1979-10-01), Miller et al.
patent: 4936955 (1990-06-01), Dobson et al.
patent: 4952386 (1990-08-01), Davison et al.
patent: 5164093 (1992-11-01), Chilton et al.
patent: 5348722 (1994-09-01), Shimono et al.

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