Method and system for exposing pattern on object by charged part

Details Method and system for exposing pattern on object by charged part Method and system for exposing pattern on object by charged part

1996-09-10

1998-04-28

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25049222, H01J 37302

Patent

active

057448108

ABSTRACT:
A cyclic wave v1 of a cycle T/m, such as a sine wave or a pulse wave, is generated, where T is one exposure period and m is a natural number. For each i=1 to 3, cyclic waves v2 to v4 are generated by delaying the cyclic wave v1 by i(T/4m), amplified and supplied to the electrodes of electrostatic deflectors 40, 50 and 60 in such a way that the electric fields formed at the deflectors 40 and 50 have opposite phases each other. For each electrostatic deflector, the phase difference between the voltage waveforms supplied to adjacent electrodes is T/4m and m may be set freely.

REFERENCES:
patent: 4942342 (1990-07-01), Tsukakoshi
patent: 5148033 (1992-09-01), Yamada et al.
patent: 5368613 (1994-11-01), Yasutake et al.

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