Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1980-06-20
1982-08-10
Powell, William A.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
156647, 1566591, 156904, 428138, 428428, 430198, 430313, 430330, G03F 900, H01L 21312, B44C 122, C03C 1500
Patent
active
043438750
ABSTRACT:
A method of etching a silicon-substrate, wherein a protective layer is formed on the substrate and serves as an etching mask, at least one some areas of the surface of the substrate. A layer of mineral glass, adhering to the substrate, is used for this protective coating. The protective layer can be formed by the application of a mixture containing finely dispersed mineral glass and fixing agents, or a composition which will form mineral glass when heated, to the Si-substrate, by heating the mixture to form a layer of mineral glass adhering to the Si-substrate. If photo-polymerizable components are used in this mixture, the etching mask of glass may be produced by way of photolithography. The invention further includes a Si-substrate provided with a mineral glass protective layer.
REFERENCES:
patent: 3575746 (1971-04-01), Cheskis et al.
patent: 3765969 (1973-10-01), Kragness et al.
patent: 3888708 (1975-06-01), Wise et al.
patent: 4040893 (1977-08-01), Ghezzo
BBC Brown Boveri & Company Limited
Powell William A.
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