X-ray lithography source

X-ray or gamma ray systems or devices – Photographic detector support – With object support or positioning

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

378 34, G21K 500

Patent

active

050777742

ABSTRACT:
A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

REFERENCES:
patent: 4763344 (1988-08-01), Piestrup
patent: 7378907 (1989-07-01), Piestrup
J. R. Maldonado, "X-Ray Lithography, Where it is Now & Where it is Going" (paper presented at the 2nd Workshop on Radiation Induced & on Processing Related Electrically Active Defects on Semiconductor-Insulator Systems, Sep. 1989, MCNC, N.C.
Richard Holman, Intel Corporation, "X-Ray Lithography Using Broadband Sources" (1986) This paper Compares a Variety of Soft XC-Ray Sources for Lithography.
R. H. Pantell, R. A. Gearhart, F. R. Buskirk, "Transition Riadiation as an X-Ray Source," IEEE Quant Electr., vol. 19, pp. 1771-1781, Dec. 1983.
Alan G. Michette, "Optical Systems for Soft X-Rays," (Plenum Press N.Y., 1986) Chap. 2 and 3, p. 37 94.
E. Spiller & R. Feder, "X-Ray Lithography, " Topics in Applied Physics, vol. 22 (New York 1977).
M. A. Piestrup, J. O. Kephart, H. Park, R. K. Klein, R. H. Pantell, P. J. Ebert, M. J. Moran, B. A. Dahling & B. L. Berman, "Measurement of Transition Radiation Form Medium Energy Electrons," Phys Rev. A, vol. 32, pp. 917-927, Aug. 1985.
M. A. Piestrup, M. J. Moran, B. L. Berman, P. Pianetta, D. Seligson, "Transition Radiation as an X-Ray Source for Lithography", SPIE, vol. 773, Electron-Beam X-Ray & Ion Beam Lithographies, pp. 37-44, 1987.
M. L. Cherry, G. Hartman, D. Muller, & T. A. Prince, "Transition Radiation from Relativistic Electrons in Periodic Radiators", Phys Rev. D, vol. 10, pp. 3594-3607, Dec. 1974.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

X-ray lithography source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-ray lithography source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray lithography source will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1515624

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.