Method for cleaning substrates

Cleaning and liquid contact with solids – Processes – Using solid work treating agents

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Details

134 7, 134 32, 134 33, 134 37, 134902, 15 211, 15 77, 15 882, 15302, B08B 100, B08B 104, B08B 304

Patent

active

058581120

ABSTRACT:
A substrate cleaning method in which the substrate is rotated and cleaned utilizing a brush which is brought into contact with the substrate. In accordance with one presently preferred aspect, the substrate is held between a stepped portion and a stopper portion at the fringe of the substrate, thereby preventing movement of the substrate as it is rotated and the brush is brought into contact with the substrate. In accordance with another aspect, a freely rotatable brush is brought into contact with the substrate so that the brush can rotate with the rotating substrate, and damage to the substrate can be minimized.

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patent: 5144711 (1992-09-01), Gill, Jr.
patent: 5345639 (1994-09-01), Tanoue et al.
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5361449 (1994-11-01), Akimoto
patent: 5375291 (1994-12-01), Tateyama et al.
patent: 5485644 (1996-01-01), Shinbara et al.

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