Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent
1996-09-25
1999-09-14
Breneman, Bruce
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
438718, 134 12, H01L 21461
Patent
active
059522453
ABSTRACT:
Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample treatment, (c) for wet-processing of the samples and (d) for dry-processing the samples. A plurality of wet-processing treatments of a sample can be performed. The wet-processing apparatus can include a plurality of wet-processing stations. The samples can either be passed in series through the plurality of wet-processing stations, or can be passed in parallel through the wet-processing stations.
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Fukuyama Ryooji
Kawahara Hironobu
Kawasaki Yoshinao
Nojiri Kazuo
Sato Yoshiaki
Alejandro Luz
Breneman Bruce
Hitachi , Ltd.
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