Patent
1994-07-21
1996-01-23
Rutledge, D.
G03D 1300
Patent
active
054868904
ABSTRACT:
The present invention provides a system for controlling the temperatures of processing solutions in a photosensitive material processor, which enables the temperatures of processing solutions to be controlled with a smaller power source capacity yet with high efficiency. In a photosensitive material processor including a plurality of processing tanks 12 to 19 for processing a photosensitive material F and a drier 30, at least one processing tank is provided with a plurality of independently controllable electric heaters N1-1 to 1-3 capable of heating the processing solution therein. Depending on the heat capacity needed for each processing tank, power supply to the heater for the processing tank under low load is stopped when the power consumption of the processor proper is increased, thereby achieving an efficient distribution of power and, hence, enabling power source equipment of very small capacity to be used.
REFERENCES:
patent: 4451132 (1984-05-01), Kishimoto
patent: 4755843 (1988-07-01), Foley
patent: 4813440 (1989-03-01), Johnson et al.
patent: 4888608 (1989-12-01), Kummerl
patent: 5148206 (1992-09-01), Shidara
patent: 5168296 (1992-12-01), Nakamura et al.
patent: 5235371 (1993-08-01), Samuels
patent: 5313241 (1994-05-01), Seim
Fuji Photo Film Co. , Ltd.
McKenna Peter A.
Rutledge D.
Turner Richard C.
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