Process for the production of monosilandiol

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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423438, 423520, 423551, 423579, C01B 3300, C01D 502, C01B 1300, C01B 3120

Patent

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039377822

ABSTRACT:
A dry alkaline earth metal silicate or an alkali metal silicate is reacted with a concentrated mineral acid to form silico-formic acid and hydrogen salt. The acid and hydrogen salt is reacted with a dry alkali metal carbonate or hydroxide to produce monosilanal. Monosilanol is reacted with water to produce monosilandiol.

REFERENCES:
patent: 1903187 (1933-03-01), McClenahan
patent: 3345132 (1967-10-01), Wulf

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