Method for amending a photomask

Details Method for amending a photomask Method for amending a photomask

1986-12-11

1988-12-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

355 86, 427 531, 430 22, 430 30, 430945, G03F 900

Patent

active

047896116

ABSTRACT:
A method for amending a defective mask pattern of a photomask. A pattern component of a normal mask pattern having the same pattern layout as that of the defective mask pattern to be amended is irradiated by a spotlight. The shape of the spotlight is aligned with the shape of the pattern component which is the same pattern as the component of the defective mask pattern to be amended. At least one base mark is aligned with at least another pattern component near the irradiated portion. Then, the position of the base mark relative to the position of the irradiated portion is fixed. After that, the normal mask pattern is replaced by the defective mask pattern. The base mark is aligned with a pattern component near the defective pattern component in the same manner as the alignment of the normal mask pattern. After that, the spotlight irradiates the defective mask pattern, the luminous intensity of said spotlight being intensified so that it can amend the defective pattern component.

REFERENCES:
patent: 3245794 (1966-04-01), Conley
patent: 3748975 (1973-07-01), Tarabocchia
patent: 3844655 (1974-10-01), Johannsmeier
patent: 4052603 (1977-10-01), Karlson
patent: 4200668 (1980-04-01), Segal et al.

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