Wafer holding mechanism

Details Wafer holding mechanism Wafer holding mechanism

1987-08-11

1988-12-06

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134153, 118 54, 156345, C23F 102, B05C 1100, B08B 300

Patent

active

047889942

ABSTRACT:
A wafer holding mechanism horizontally holds, one at a time, wafers which are sequentially transported thereto. Wafers are treated with liquids such as an etchant, rinsing liquid, and the like, at the same time that the wafer is rotated at a high speed. The mechanism includes a hollow rotary shaft having an upper end thrust into a housing, a rotary plate horizontally mounted on the upper end of the rotary shaft, chuck pieces provided on the rotary plate for holding an outer peripheral edge of the wafer, the chuck pieces being movable in the radial direction of the rotating plate between a holding position wherein the wafer is tightly held by the chuck pieces and a release position wherein the wafer is free to be removed from the chuck pieces.

REFERENCES:
patent: 4280442 (1981-07-01), Johnson
patent: 4439261 (1984-03-01), Pavone et al.
patent: 4457419 (1984-07-01), Ogami et al.
patent: 4473455 (1984-09-01), Dean et al.
patent: 4489740 (1984-12-01), Rattan et al.

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