Exposure apparatus for production of integrated circuit

Details Exposure apparatus for production of integrated circuit Exposure apparatus for production of integrated circuit

1986-08-11

1988-12-06

McGraw, Vincent P.

Optics: measuring and testing

Lamp beam direction or pattern

355 53, 355 68, 355 72, 356218, 356225, G01J 142, G03B 2742

Patent

active

RE0327956

ABSTRACT:
An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angles. The improvement comprises illumination detection means provided with a photo reception surface, and means for mounting the illumination detection means on the stage in such a manner that the photo reception surface and the surface of the semiconductor wafer on the stage to be exposed are at substantially equal height relative to the stage.

REFERENCES:
patent: 1244159 (1916-05-01), Adsit
patent: 3100429 (1963-08-01), Koch
patent: 3867036 (1975-02-01), Detwiler et al.
patent: 4205918 (1980-06-01), Kisanuki et al.
patent: 4320462 (1982-03-01), Lund et al.
patent: 4345836 (1982-08-01), Phillips
Blum et al., "Beam Position and Intensity Analyzing Device", IBM Tech. Disc. Bulletin, vol. 12, #10, 3/1970, pp. 1594-1595, copy 356/121.

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