Microlithography reticle exhibiting reduced stresses and methods

Details Microlithography reticle exhibiting reduced stresses and methods Microlithography reticle exhibiting reduced stresses and methods

1999-01-29

2000-07-04

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

060836482

ABSTRACT:
Reticles are disclosed for charged-particle-beam microlithography. Such reticles comprise a reticle membrane. A first set of parallel struts extends at a first pitch in a first direction and a second set of parallel struts extends at a second pitch (higher than the first pitch) in a second direction perpendicular to the first direction and intersecting the first set of struts. The struts are attached to the first major surface of the membrane and partition the membrane into multiple rectangular fields each comprising a respective portion of the membrane extending between respective intersecting struts. The second struts are flanked by boundary regions each having a width larger than 1/5 of the width of the respective field.

REFERENCES:
patent: 5798194 (1998-08-01), Nakasuji et al.
patent: 5972794 (1999-10-01), Katakura

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