Photoresist composition with improved differential solubility th

Details Photoresist composition with improved differential solubility th Photoresist composition with improved differential solubility th

1996-01-04

1997-06-24

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430190, 430193, G03F 7023

Patent

active

056416040

ABSTRACT:
A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.

REFERENCES:
patent: 4732837 (1988-03-01), Potvin et al.
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5362600 (1994-11-01), Sinta et al.

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