Method for fabricating phase shift mask

Details Method for fabricating phase shift mask Method for fabricating phase shift mask

1995-11-28

1997-06-24

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430326, 430394, G03F 900

Patent

active

056415923

ABSTRACT:
A method for fabricating a half-tone mask having a main chip region and a guard-board region, in which a deposition on entire surface by electrolytic process is made possible to simplify the fabricating process, including the steps of providing a transparent substrate, forming a half-tone mask on the transparent substrate, and selectively forming light shielding layers in the guard-board region of the half-tone mask.

REFERENCES:
patent: 5429897 (1995-07-01), Yoshioka et al.

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