Method for heating semiconductor wafers by a light-radiant heati

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

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219405, 219388, 219354, 118725, 432225, H05B 100

Patent

active

044939779

ABSTRACT:
Disclosed herein is a method for operating a light-radiant heating furnace which includes a main heater capable of irradiating light onto an object to heat it up and a subsidiary heater adapted principally to additionally heat a peripheral portion of said object, which method includes actuating said main heater and subsidiary heater repeated in accordance with their respective actuation curves, which have in advance been prepared, in synchronization with intermittent transportation of objects into said light-radiant heating furnace. The light-radiant heating furnace permits a uniform heat treatment of objects always with high efficiency but without development of slip line or warping, even when they are semiconductor wafers and are heated up in short time periods.

REFERENCES:
patent: 3539759 (1970-11-01), Spiro
patent: 3591767 (1971-07-01), Mudie
patent: 3609295 (1971-09-01), Bielefeldt
patent: 3760154 (1973-09-01), Konger
patent: 3836751 (1974-09-01), Anderson
patent: 4101759 (1978-07-01), Anthony
patent: 4223048 (1980-09-01), Engle

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