Electrophotographic photosensitive member using microcrystalline

Details Electrophotographic photosensitive member using microcrystalline Electrophotographic photosensitive member using microcrystalline

1982-05-26

1985-12-24

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 66, 430 95, 430128, 427 39, G03G 508

Patent

active

045606340

ABSTRACT:
An electrophotographic photosensitive member constituted of an electroconductive supporting substrate and a photoconductive layer provided on said substrate, said photoconductive layer being composed primarily of a microcrystalline silicon or a layered product of a microcrystalline silicon and an amorphous silicon.

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patent: 4265991 (1981-05-01), Hirai et al.
patent: 4420546 (1983-12-01), Kanbe et al.
Uchida et al., Journal de Physique pp. C4-265-268 10/81.
Y. Mishimi et al., Japanese Journal of Applied Physics, 20 LIZI (1980).
Hamasaki et al., Appl. Phys. Lett. 37 (12), pp. 1084, 1085, 1086, Dec. 15, 1980.
Y. Imai et al., Annual Meeting of the Japanese Soc. of Appl. Phys., 7a-A-4, Oct. 1977.
European Search Report, IBM Technical Disclosure Bulletin, vol. 21, No. 11, Apr. 1979, p. 4691, New York, USA, R. Tsu et al.: "New Type of Thin Film Hybrid Crystalline-Amorphous Si Solar Cell with High Light Absorption P-I-N Structure".
Patents Abstracts of Japan, vol. 6, No. 38(P-105)(916), Mar. 9, 1982, Tokyo, Japan & JP-A-56 155 945, Shibaura Denki K.K., 2/12/81.
J. Electrochem. Soc.: Solid-State Science and Technology; vol. 122, No. 5, pp. 701-706 (May 1975) Seto.
J. Electrochem. Soc.: Solid-State Science and Technology; vol. 120, No. 12, pp. 1761-1766 (Dec. 1973) Rai-Choudhury et al.

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