Process for forming amorphous silicon film

Details Process for forming amorphous silicon film Process for forming amorphous silicon film

1982-03-01

1984-05-22

Hoffman, James R.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 74, H01L 4500

Patent

active

044501854

ABSTRACT:
A process for forming a deposition film on a substrate comprising introducing a deposition film forming material in gaseous state into a deposition chamber, the inside pressure of which is reduced, and causing an electric discharge to take place in a gaseous atmosphere of said deposition film forming material, said process comprising introducing a starting material in gaseous state for preparing said deposition film forming material into a discharge reaction chamber, causing a discharge to take place in a gaseous atmosphere of said starting material to give rise to a reaction of said starting material, and introducing the resulting reaction product into said deposition chamber through a transport means connecting said discharge reaction chamber with said deposition chamber, by which the steps including from the step of preparing said deposition film forming material to the step of forming said deposition film are effected continuously.

REFERENCES:
patent: 3961103 (1976-06-01), Aisenberg
patent: 4064521 (1977-12-01), Carlson

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