Buffer centering system

Brushing – scrubbing – and general cleaning – Implements – Fabric

Patent

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Details

15230, 1523012, B24B 2900

Patent

active

060819596

ABSTRACT:
The present invention involves a centering system for a polishing pad that is releasably attached to a backing mount. The pad has a generally flat polishing face and may employ a fabric shag pile or foam for buffing, polishing, or otherwise finishing a surface, such as painted sheet metal. The opposite face of the pad is a mounting surface and has an axially aligned centering post projecting therefrom toward the backing mount. The backing mount is a stiff structure that has a socket defined at its axial center. The size and cross section of the socket are configured to conform to the size and cross section of the centering post so that the centering post on the mounting surface of the pad fits snugly into the coaxially aligned socket on the facing side of the backing mount. Mutually engageable layers of flexible, hook and loop fastening material are respectively attached to the mounting surface of the pad and the surface of the backing mount that faces the pad. The flexible hook and loop fastening system thereby releasably attaches the pad to the backing mount, while the centering system maintains the pad and backing mount in mutually coaxial alignment.

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Buff and Shine Performance Products Catalog.

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