Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Post imaging process – finishing – or perfecting composition...
Patent
1980-02-28
1982-08-03
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Post imaging process, finishing, or perfecting composition...
430122, 430103, 4301066, G03G 1309
Patent
active
043428223
ABSTRACT:
Method and apparatus for image development, wherein a space gap between a latent image holding member and a developer carrying member is made wider, at a developing section, than thickness of the developer layer on the surface of the developer carrying member, and both members are opposed each other for developing operation, and wherein the developer to be used is composed of electrically insulative toner particles having an average particle diameter of from 5.mu. to 30.mu. and very fine particles having a particle diameter smaller than that of the toner particles and capable of assisting electric charging of the toner particles in a polarity opposite to that of the latent image, the fine particles being added to the toner particles and mixed together.
REFERENCES:
patent: 3196032 (1965-07-01), Seymour
patent: 3703157 (1972-11-01), Maksymiak et al.
patent: 3893418 (1975-07-01), Liebman et al.
patent: 4014291 (1977-03-01), Davis
patent: 4082681 (1978-04-01), Takayama et al.
patent: 4254203 (1981-03-01), Oka et al.
Hosono Nagao
Kanbe Junichiro
Canon Kabushiki Kaisha
Goodrow John L.
Schilling Richard L.
LandOfFree
Method for image development using electric bias does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for image development using electric bias, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for image development using electric bias will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1468697