Periphery exposing apparatus and method

Details Periphery exposing apparatus and method Periphery exposing apparatus and method

1997-06-03

1999-11-09

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Step and repeat

355 50, G03B 2742, G03B 2748

Patent

active

059824743

ABSTRACT:
A method and apparatus for exposing a substrate to light perform the steps of inputting position data of a peripheral region along an outline of a chip region on a substrate, which has been placed on a spin chuck, detecting a reference position at an outer edge of the substrate inputting axial directions of the position data and aligning axial directions of an orthogonal shifting mechanism. Based on the position data inputted, light of an irradiator is shifted along the peripheral region to expose the peripheral region in a staggered way along the outline of the chip region. The method and apparatus may also perform the steps of inputting a shape of the chip region on the substrate as image information, deriving position data of the peripheral region along the outline of the chip region from the image information, and exposing the peripheral region to light based on the position data derived. The method and apparatus may also perform the steps of inputting shape information of the substrate, the chip region, and an area around a crossing point of scribe lines in the chip region on the substrate as image information, computing the positions of the peripheral region from the image information and the shape information of the substrate and the chip region; and exposing the peripheral region to light based on the positions of the computed peripheral region.

REFERENCES:
patent: 4899195 (1990-02-01), Gotoh
patent: 4910549 (1990-03-01), Sugita
patent: 5168021 (1992-12-01), Arai et al.
patent: 5168304 (1992-12-01), Hattori
patent: 5229811 (1993-07-01), Hattori et al.
patent: 5289263 (1994-02-01), Kiyokawa et al.
patent: 5361121 (1994-11-01), Hattori et al.
patent: 5420663 (1995-05-01), Nakajima et al.

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