Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-12-04
2000-01-11
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
060133996
ABSTRACT:
A reworkable EUV mask (100) includes a substrate (40), a reflective layer (42) overlying the substrate (40), and a buffer layer (44) overlying the reflective layer (42). An absorbing layer (102) composed of primarily a non-heavy metal material overlies the buffer layer (44) for absorbing radiation which is incident thereon. The absorbing layer (102) exhibits a substantially high etch selectivity with respect to the reflective layer (42) and thus is easily removed without substantially impacting the reflectivity of the reflective layer (42) during rework.
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Advanced Micro Devices , Inc.
Rosasco S.
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