Method for forming a thin film of a complex compound

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

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427553, 427554, 427557, 427558, 427226, 4271263, B05D 306, B05D 302

Patent

active

060133341

ABSTRACT:
The present invention provides a method for forming a thicker thin film of complex compound easily without causing cracks in the film. Sol solution is coated and dehydrated on an upper surface of a substrate by sol-gel method (step S1, S2). A thin film formed on the upper surface of the substrate is exposed by radiation which has predetermined energy (step S3). Thus, the thin film of complex compound is polymerized, cracks are not caused even in forming a thicker thin film.

REFERENCES:
Nakao et al, Jpn. J. Appl. Phys. vol. 32, Part I, No. 9B, Sep. 1993, pp. 4141-4143.

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