Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1982-06-16

1985-04-16

Thomas, James D.

Boots, shoes, and leggings

250398, 2504923, 364571, H01J 312

Patent

active

045119805

ABSTRACT:
Dot pattern data stored in the first dot pattern memory is read out by a predetermined number of successive bits at a time under the control of a microprocessor and corrected with respect to an X direction. The corrected dot pattern data is temporarily stored in a main memory. The dot pattern data stored in the main memory is then corrected with respect to a Y direction. The resultant corrected dot pattern data is stored in a second dot pattern memory for use for electron beam blanking control.

REFERENCES:
patent: 3900737 (1975-08-01), Collier et al.
patent: 3943344 (1976-03-01), Kidode et al.
patent: 4280186 (1981-07-01), Hidai et al.
patent: 4387433 (1983-06-01), Cardenia et al.
patent: 4390788 (1983-06-01), Hayashi et al.
patent: 4430571 (1984-02-01), Smith et al.

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