Removal of surface contaminants by irradiation from a high-energ

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 19, 437907, 437908, 437939, 437942, 437946, 148DIG17, 148DIG91, 148DIG93, 134 1, H01L 21268

Patent

active

050249681

ABSTRACT:
A method and apparatus for removing surface contaminants from the surface of a substrate by high-energy irradiation is provided. The invention enables removal of surface contaminants without altering of the substrate's underlying molecular structure. The source of high-energy irradiation may comprise a pulsed laser.

REFERENCES:
patent: 3364087 (1968-01-01), Solomon et al.
patent: 3464534 (1969-09-01), Muncheryan
patent: 3503804 (1970-03-01), Schneider
patent: 4181538 (1980-01-01), Narayan et al.
patent: 4292093 (1981-09-01), Ownby et al.
patent: 4305973 (1981-12-01), Yaron et al.
patent: 4668304 (1987-05-01), Schachameyer et al.
patent: 4680616 (1987-07-01), Delahoy et al.
patent: 4731516 (1988-03-01), Noguchi et al.
patent: 4782029 (1988-11-01), Takemura et al.
Zehner et al., "Silicon Surface Structure and Surface Impurities after Pulsed Laser Annealing", Laser and Electron Beam Processing of Materials, C. W. White and P. S. Peercy, eds., Academic Press, Inc., 1980, pp. 201-207.
Zehner et al., "Surface Studies of Laser Annealed Semiconductors", Laser-Solid Interactions and Transient Thermal Processing of Materials, Narayan, Brown, and Lemons, eds., Elsevier Science Publishing, Co., Inc., 1983, pp. 317-328.
Bedair et al., Atomically Clean Surfaces by Pulsed Laser Bombardment, 1969.
Lazzarini, et al., Lasers for the Cleaning of Statuary: Initial Results and Potentialities, 1973.
Bermudez, Changes in Surface Composition of Si, TiO.sub.2, SiO.sub.2 Induced by Pulsed Ruby-Laser Irradiation, 1-82.
Jellison et al., Time-Resolved Ellipsometry, 9-1-85.
Zehner et al., Preparation of Atomically Clean Silicon Surfaces by Pulsed Laser Irradiation, 1-1-80.
McKinley et al., Atomically Clean Semiconductor Surfaces Prepared by Laser Irradiation, 1980.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Removal of surface contaminants by irradiation from a high-energ does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Removal of surface contaminants by irradiation from a high-energ, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Removal of surface contaminants by irradiation from a high-energ will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-145643

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.